F. Javier Ferrer Fernandez

Plan Propio-Acceso
Área de conocimiento: Física Atómica Molecular y Nuclear
Departamento: Física Atómica, Molecular y Nuclear
Grupo: FISICA NUCLEAR APLICADA (RNM-138)
Tipo Año Título Fuente
Artículo2021 Research facilities and highlights at the Centro Nacional de Aceleradores (CNA) EUROPEAN PHYSICAL JOURNAL PLUS
Artículo2020 Novel solid 4 He targets for experimental studies on nuclear reactions: 6 Li + 4 He differential cross-section measurement at incident energy of 5.5 MeV EUROPEAN PHYSICAL JOURNAL PLUS
Artículo2018 Colorimetric energy sensitive scintillator detectors based on luminescent multilayer designs SENSORS AND ACTUATORS A-PHYSICAL
Artículo2018 Preparation and characterization of S-33 samples for S-33(n,alpha)Si-30 cross-section measurements at the n_TOF facility at CERN NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
Artículo2017 Early Tuberculin Skin Test for the Diagnosis of Latent Tuberculosis Infection in Patients with Inflammatory Bowel Disease JOURNAL OF CROHNS & COLITIS
Artículo2017 Energy-Sensitive Ion- and Cathode-Luminescent Radiation-Beam Monitors Based on Multilayer Thin-Film Designs ACS APPLIED MATERIALS & INTERFACES
Artículo2017 Multicolored Emission and Lasing in DCM-Adamantane Plasma Nanocomposite Optical Films ACS APPLIED MATERIALS & INTERFACES
Ponencia2017 Plasma assisted oblique angle deposition of transparent and conductive in-plane anisotropic ITO thin films Plasma Nano Science and Technology
Artículo2016 Cathode and ion-luminescence of Eu:ZnO thin films prepared by reactive magnetron sputtering and plasma decomposition of non-volatile precursors JOURNAL OF LUMINESCENCE
Artículo2016 Characterization and Validation of a-Si Magnetron-Sputtered Thin Films as Solid He Targets with High Stability for Nuclear Reactions ACS OMEGA
Artículo2016 High-rate deposition of stoichiometric compounds by reactive magnetron sputtering at oblique angles PLASMA PROCESSES AND POLYMERS
Artículo2016 Limitations of high pressure sputtering for amorphous silicon deposition MATERIALS RESEARCH EXPRESS
Artículo2016 Nanostructured Ti thin films by magnetron sputtering at oblique angles JOURNAL OF PHYSICS D-APPLIED PHYSICS
Artículo2016 Stoichiometric control of SiOx thin films grown by reactive magnetron sputtering at oblique angles PLASMA PROCESSES AND POLYMERS
Artículo2015 Er3+-doped fluorotellurite thin film glasses with improved photoluminescence emission at 1.53 µm JOURNAL OF LUMINESCENCE
Artículo2015 Microstructure of mixed oxide thin films prepared by magnetron sputtering at oblique angles THIN SOLID FILMS
Artículo2015 Modulating Low Energy Ion Plasma Fluxes for the Growth of Nanoporous Thin Films PLASMA PROCESSES AND POLYMERS
Artículo2015 Ultraviolet Pretreatment of Titanium Dioxide and Tin-Doped Indium Oxide Surfaces as a Promoter of the Adsorption of Organic Molecules in Dry Deposition Processes: Light Patterning of Organic Nanowires LANGMUIR
Artículo2014 On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles PLASMA PROCESSES AND POLYMERS
Artículo2014 Simultaneous quantification of light elements in thin films deposited on Si substrates using proton EBS (Elastic Backscattering Spectroscopy) NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Artículo2014 Structural, optical, and spectroscopic properties of Er3+-doped TeO2-ZnO-ZnF2 glass-ceramics JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
Artículo2013 A new bottom-up methodology to produce silicon layers with a closed porosity nanostructure and reduced refractive index NANOTECHNOLOGY
Artículo2013 Combined reactive magnetron sputtering and plasma decomposition of non-volatile precursors to grow luminescent thin films SURFACE & COATINGS TECHNOLOGY
Ponencia2013 Hydrogenated amorphous silicon deposited by high pressure sputtering for HIT solar cells PROCEEDINGS OF THE 2013 SPANISH CONFERENCE ON ELECTRON DEVICES (CDE 2013)
Artículo2013 Low refractive index SiOF thin films prepared by reactive magnetron sputtering THIN SOLID FILMS
Artículo2013 Preventing the degradation of Ag nanoparticles using an ultrathin a-Al2O3layer as protective barrier JOURNAL OF PHYSICAL CHEMISTRY C
Artículo2013 Tuning dichroic plasmon resonance modes of gold nanoparticles in optical thin films ADVANCED FUNCTIONAL MATERIALS
Artículo2012 Attenuation lengths of high energy photoelectrons in compact and mesoporous SiO 2 films SURFACE SCIENCE
Artículo2012 Critical thickness and nanoporosity of TiO2 optical thin films MICROPOROUS AND MESOPOROUS MATERIALS
Artículo2012 Electrochromic behavior of W xSi yO z thin films prepared by reactive magnetron sputtering at normal and glancing angles ACS APPLIED MATERIALS & INTERFACES
Artículo2012 Microstructural and chemical characterization of nanostructured Tialsin coatings with nanoscale resolution MICROSCOPY AND MICROANALYSIS
Artículo2012 Quantification of low levels of fluorine content in thin films NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Artículo2011 Fabrication and Characterization of an Epitaxial Graphene Nanoribbon-Based Field-Effect Transistor IEEE TRANSACTIONS ON ELECTRON DEVICES
Artículo2011 Initial stages of graphitization on SiC(000-1), as studied by phase atomic force microscopy JOURNAL OF APPLIED PHYSICS
Artículo2010 60 GHz current gain cut-off frequency graphene nanoribbon FET INTERNATIONAL JOURNAL OF MICROWAVE AND WIRELESS TECHNOLOGIES
Artículo2010 Graphene growth by molecular beam epitaxy on the carbon face of SiC APPLIED PHYSICS LETTERS
Artículo2010 Graphene growth by molecular beam epitaxy using a solid carbon source PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Artículo2010 Growth and characterization of nitrogen-doped TiO2 thin films prepared by reactive pulsed laser deposition THIN SOLID FILMS
Artículo2009 Atomic scale flattening, step formation and graphitization blocking on 6H-and 4H-SiC{0001} surfaces under Si flux SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Artículo2009 Electrical characteristics of mixed Zr-Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature THIN SOLID FILMS
Artículo2009 Growth mechanism and chemical structure of amorphous hydrogenated silicon carbide (a-SiC:H) films formed by remote hydrogen microwave plasma CVD from a triethylsilane precursor: part 1 CHEMICAL VAPOR DEPOSITION
Artículo2008 Accelerator-based research activities at "Centro Nacional de Aceleradores", Seville (Spain) NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Artículo2007 Deposition of TiO 2 thin films by atmospheric plasma post-discharge assisted injection MOCVD SURFACE & COATINGS TECHNOLOGY
Artículo2007 Microscopic and macroscopic dielectric description of mixed oxide thin films JOURNAL OF APPLIED PHYSICS
Artículo2007 Optical refractive index and static permittivity of mixed Zr-Si oxide thin films prepared by ion beam induced CVD THIN SOLID FILMS
Artículo2007 Size and shape of supported zirconia nanoparticles determined by x-ray photoelectron spectroscopy JOURNAL OF APPLIED PHYSICS
Artículo2004 Study of the stoichiometry transfer in pulsed laser deposition of bioactive silica-based glasses THIN SOLID FILMS

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